领先的欧洲物理研究机构选择 Veeco MOCVD 系统进行基于氮化物的研究和开发
2015 年 02 月 11 日
Plainview, New York, February 11, 2015 – Veeco Instruments Inc. (Nasdaq: VECO) announced today that the Fraunhofer Institute for Applied Solid State Physics IAF, a leading German compound semiconductor research institution, has purchased a TurboDisc® K465i Gallium Nitride (GaN) MOCVD System.
Located in Freiburg, Germany, Fraunhofer conducts cutting-edge research in the field of III-V semiconductors. They develop electronic and optoelectronic devices based on modern micro and nanostructures for applications such as security, energy, communication, health, and mobility.
“After more than a decade of research in the field of nitride epitaxy on sapphire, silicon and silicon-carbide substrates, we have decided to upgrade our operation to include Veeco’s MOCVD technology,” said Dr. Martin Walther, Head of the Epitaxy Department and Deputy Director at Fraunhofer. “The K465i offers a clean process and exceptional run-to-run repeatability that will enable us to achieve new levels of development in high growth markets.”
Veeco’s award-winning K465i MOCVD systems feature excellent film quality, low defects and high productivity, which are key for effective GaN processing. The system also incorporates Veeco's Uniform FlowFlange® technology for superior uniformity and excellent run-to-run repeatability. Since its introduction in 2010, the K465i has been the top selling MOCVD system worldwide.
“Being selected by a leading compound semiconductor institution such as Fraunhofer Institute is further evidence that Veeco’s leading MOCVD systems are the ideal solution for various GaN-based epitaxy applications,” said Jim Jenson, Senior Vice President, General Manager, Veeco MOCVD. “We strive to provide innovative process solutions, including the recent introduction of the Propel™ PowerGaN™ MOCVD system for power electronics devices. As we innovate, our TurboDisc and Propel platforms provide outstanding performance for compound semi R&D and production leaders.”
About Fraunhofer IAF
Fraunhofer IAF develops electrical and optical devices based on compound semiconductors. The Institute was founded in 1957 and is one of the leading research facilities in the field of III-V semiconductors. Fraunhofer IAF employs over 280 people in an entire spectrum of areas: from analysis of materials and design to the realization of modules and systems. The technologies of Fraunhofer IAF are used in various fields of application, such as security, energy, communication, health and mobility. The Institute has approximately 170 partners in industry and research. For more information please visit http://www.iaf.fraunhofer.de/en.html.
Veeco’s process equipment solutions enable the manufacture of LEDs, flexible OLED displays, power electronics, compound semiconductors, hard drives, semiconductors, MEMS and wireless chips. We are the market leader in MOCVD, MBE, Ion Beam, Wet Etch single wafer processing and other advanced thin film process technologies. 我们的高性能系统推动了能效、消费类电子产品和网络存储领域的创新，并且可以最大程度地提高我们客户的生产率并降低其拥有成本。For information on our company, products and worldwide service and support, please visit www.veeco.com.
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Jeffrey Pina 516-677-0200 x1222