Veeco 离子束刻蚀技术可达到无故障运行 100,000 栅格/分钟的里程碑。
2014 年 12 月 11 日
Plainview, N.Y., December 11, 2014 – Veeco Instruments Inc.(Nasdaq:VECO) announced today that its NEXUS® Ion Beam Etch (IBE) system has achieved 100,000 operating minutes without failure during commercial production operation. This milestone demonstrates a fivefold increase in grid life, significantly improving total cost of ownership and reducing tool downtime.
The Veeco NEXUS IBE systems are used for many applications including the process of precisely etching metallic films to create the magnetic sensors used for a wide variety of mobile, automotive, MRAM, and hard disk drive devices.
“With this improved longevity, our customers do not need to perform preventive maintenance as frequently, resulting in increased tool utilization and decreased operating cost,” commented Tim Pratt, Senior Marketing Director of Veeco Advanced Deposition & Etch. “As the leading manufacturer of production-proven ion beam technology equipment, we continue to earn the trust of our customers with focused R&D and products to solve their technical and commercial challenges.”
About Veeco Ion Beam Etch Technology
Veeco’s NEXUS IBE systems perform ion-based “milling” of a variety of materials. Veeco has shipped over 300 ion beam etch modules for production use, making it the world’s leader in production-optimized ion beam etch technology. Veeco supports low-cost manufacturing usage with long-life solutions and a full-service refurbishment program for consumable parts.
Veeco’s process equipment solutions enable the manufacture of LEDs, flexible OLED displays, power electronics, hard drives, MEMS and wireless chips. 我们是 MOCVD、MBE、离子束和其他高级薄膜工艺技术的市场领导者。我们的高性能系统推动了能效、消费类电子产品和网络存储领域的创新，并且可以最大程度地提高我们客户的生产率并降低其拥有成本。For information on our company, products and worldwide service and support, please visit www.veeco.com.
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