金属有机化学气相沉积系统 (MOCVD)

金属有机化学气相沉积系统 (MOCVD)

Propel emPower GaN MOCVD 系统

Propel emPower GaN MOCVD 系统

Accelerating High Volume Manufacturing of Leading-edge Gallium Nitride (GaN) Devices for Power and RF Applications

Veeco 的 emPower 优势

Veeco 的新型 Propel® emPower™ GaN MOCVD 系统专为大批量电力电子行业而设计。emPower 系统采用能够处理 8 英寸和 12 英寸晶圆的单晶圆反应器平台,可存放高质量的 GaN 薄膜,从而生产出高效的电力电子器件。Veeco’s proprietary TurboDisc®, IsoFlange™ and SymmHeat™ technologies ensure the new systems offer homogenous laminar flow and uniform temperature profile across the entire wafer, resulting in unmatched within-wafer uniformity. Additionally, they provide excellent run-to-run repeatability without requiring an in-situ cleaning step, resulting in high uptime with more than 150 runs between maintenance. Engineered to offer versatility, the systems can process six- and eight-inch wafers in single-wafer mode, as well as two- to four-inch wafers in mini-batch mode. The single-wafer reactor platform’s wide process window coupled with capacity scalability provides the most flexible solution in the industry today.  

  • Unparalleled performance for thickness and composition uniformity, dopant control and defects
  • TurboDisc technology with exceptional long campaign production throughput
  • Best-in-class flexibility with wide process window and ease of operation
  • Lowest cost of ownership with industry’s highest production uptime

 

 

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