参考文献

Veeco CNT ALD customers are at the leading edge of ALD research around the world resulting in more publications than on any other commercial ALD platforms.

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Molecular interfaces for plasmonic hot electron photovoltaics

Author(s): Pelayo Garc�a de Arquer, F, Mihi, Agustin and Konstantatos, Gerasimos

Published: 2015

Web link: http://xlink.rsc.org/?DOI=C4NR06356B

Highly-Conformal TiN Thin Films Grown by Thermal and Plasma-Enhanced Atomic Layer Deposition

Author(s): Assaud, L: Pitzschel, K: Hanbucken, M: Santinacci, L

Published: 2014

Web link: http://jss.ecsdl.org/cgi/doi/10.1149/2.0141407jss

(Invited) Frequency Dispersion and Band Alignments in ZrO2/n-GaAs MOS Capacitor

Author(s): Konda, R. B., White, C, Thomas, D, Yang, Q, Sahu, D and Pradhan, A. K.

Published: 2014

Web link: http://ecst.ecsdl.org/cgi/doi/10.1149/06102.0125ecst

Perspectives on future directions in III-N semiconductor research

Author(s): Eddy Jr, Charles R: Nepal, Neeraj: Hite, Jennifer K: Mastro, Michael A

Published: 2013

Web link: http://scitation.aip.org/content/avs/journal/jvsta/31/5/10.1116/1.4813687

Using top graphene layer as sacrificial protection during dielectric atomic layer deposition

Author(s): Tang, Xiaohui: Reckinger, Nicolas: Poncelet, Olivier: Louette, Pierre: Colomer, Jean-Fran�ois: Raskin, Jean-Pierre: Hackens, Benoit: Francis, Laurent A

Published: 2014

Web link: http://arxiv.org/abs/1403.3787

Epitaxial Growth of Cubic and Hexagonal InN Thin Films via Plasma-Assisted Atomic Layer Epitaxy

Author(s): Nepal, Neeraj: Mahadik, Nadeemullah A: Nyakiti, Luke O: Qadri, Syed B: Mehl, Michael J: Hite, Jennifer K: Charles R Eddy, Jr

Published: 2013

Web link: http://pubs.acs.org/doi/abs/10.1021/cg3016172

In Situ Electrical Studies of Ozone Based Atomic Layer Deposition on Graphene

Author(s): Jandhyala, S, Mordi, G, Lee, B and Kim, J

Published: 2012

Web link: http://ecst.ecsdl.org/cgi/doi/10.1149/1.3700451

All-optical active switching in individual semiconductor nanowires

Author(s): Piccione, Brian, Cho, Chang-Hee, van Vugt, Lambert K and Agarwal, Ritesh

Published: 2012

Web link: http://www.nature.com/doifinder/10.1038/nnano.2012.144

Highly photoactive Ti-doped �-Fe2O3 thin film electrodes: resurrection of the dead layer

Author(s): Zandi, Omid, Klahr, Benjamin M and Hamann, Thomas W

Published: 2013

Web link: http://xlink.rsc.org/?DOI=c2ee23620f

The influence of N2/H2 and ammonia N source materials on optical and structural properties of AlN films grown by plasma enhanced atomic layer deposition

Author(s): Alevli, Mustafa: Ozgit, Cagla: Donmez, Inci: Biyikli, Necmi

Published: 2011

Web link: http://linkinghub.elsevier.com/retrieve/pii/S0022024811007421