参考文献

Veeco CNT ALD customers are at the leading edge of ALD research around the world resulting in more publications than on any other commercial ALD platforms.

Select the year of publication:

All

Optional - Enter a keyword or phrase to search for:

A comparison between HfO2/Al2O3 nano-laminates and ternary HfxAlyO compound as the dielectric material in InGaAs based metal-oxide-semiconductor (MOS) capacitors

Author(s): Krylov, Igor, Pokroy, Boaz, Eizenberg, Moshe and Ritter, Dan

Published: 2016

Web link: http://scitation.aip.org/content/aip/journal/jap/120/12/10.1063/1.4962855

Deep electron traps in HfO2-based metal-oxide-semiconductor capacitors

Author(s): Salomone, L Sambuco, Lipovetzky, J, Carbonetto, S H, Garc�a Inza, M A, Redin, E G, Campabadal, F and Faigon, A

Published: 2016

Web link: http://linkinghub.elsevier.com/retrieve/pii/S0040609016000109

Double nitridation of crystalline ZrO2/Al2O3 buffer gate stack with high capacitance, low leakage and improved thermal stability

Author(s): Huang, Jhih-Jie: Tsai, Yi-Jen: Tsai, Meng-Chen: Lee, Min Hung: Chen, Miin-Jang

Published: 2015

Web link: http://linkinghub.elsevier.com/retrieve/pii/S016943321500015X

Mechanistic Insight into the Stability of HfO2?Coated MoS2 Nanosheet Anodes for Sodium Ion Batteries

Author(s): Ahmed, Bilal, Anjum, Dalaver H, Hedhili, Mohamed N and Alshareef, Husam N

Published: 2015

Web link: http://onlinelibrary.wiley.com/doi/10.1002/smll.201500919/full

Experimental and numerical investigations into the transient multi-wafer batch atomic layer deposition process with vertical and horizontal wafer arrangements

Author(s): Pan, Dongqing, Ma, Lulu, Xie, Yuanyuan, Wang, Fenfen, Jen, Tien-Chien and Yuan, Chris

Published: 2015

Web link: http://linkinghub.elsevier.com/retrieve/pii/S0017931015008418

Investigation of the impact of insulator material on the performance of dissimilar electrode metal-insulator-metal diodes

Author(s): Alimardani, Nasir: King, Sean W: French, Benjamin L: Tan, Cheng: Lampert, Benjamin P: Conley, Jr, John F

Published: 2014

Web link: http://scitation.aip.org/content/aip/journal/jap/116/2/10.1063/1.4889798

Enhancement of Light Emission from Silicon by Precisely Tuning Coupled Localized Surface Plasmon Resonance of a Nanostructured Platinum Layer Prepared by Atomic Layer Deposition (ACS Publications)

Author(s): Ko, C T, Han, Y Y, Wang, W C and Shieh, J

Published: 2014

Web link: http://pubs.acs.org/doi/abs/10.1021/am405853d

Role of plasma enhanced atomic layer deposition reactor wall conditions on radical and ion substrate fluxes

Author(s): Sowa, Mark J

Published: 2014

Web link: http://link.aip.org/link/JVTAD6/v32/i1/p01A106/s1&Agg=doi

Low temperature deposition of Ga2O3 thin films using trimethylgallium and oxygen plasma

Author(s): Donmez, I.: Ozgit-Akgun, C

Published: 2013

Web link: http://ieeexplore.ieee.org/xpls/abs_all.jsp?arnumber=6330734

Electrical conductivity and photoresistance of atomic layer deposited Al-doped ZnO films

Author(s): Mundle, Rajeh M, Terry, Hampton S, Santiago, Kevin, Shaw, Dante, Bahoura, Messaoud, Pradhan, Aswini K, Dasari, Kiran and Palai, Ratnakar

Published: 2013

Web link: http://link.aip.org/link/JVTAD6/v31/i1/p01A146/s1&Agg=doi