Product News | Apr 02, 2014
GENxplor R&D MBE System Recognized for Breakthrough Innovation
PLAINVIEW, N.Y.–(BUSINESS WIRE)–Apr. 2, 2014– Veeco Instruments Inc. (Nasdaq:VECO) announced today that its GENxplor™ R&D Molecular Beam Epitaxy (MBE) System won the Compound Semiconductor (CS) Industry Award for the biggest breakthrough in compound semiconductor manufacturing over the last 12 months.
“The CS Industry Awards recognize companies that have won the approval of their peers,” said Richard Stevenson, Editor, Compound Semiconductor Magazine. “I believe that many readers voted for the GENxplor because they understand that university researchers are looking for a tool that is robust, relatively small, and capable of allowing them to carry out their research as quickly and successfully as possible.”
The GENxplor is a fully integrated deposition system that creates high quality epitaxial layers on substrates up to 3” in diameter and is ideal for cutting edge research on a wide variety of materials including GaAs, nitrides, and oxides. Its efficient single frame design makes it up to 40% smaller than other MBE systems, saving valuable lab space and reducing installation time. GENxplor 的开放式结构设计同样加强了易用性，便于使用裂解蒸镀瓶，且相比其他 MBE 系统更易维护。
This is the second time in three years that Veeco has won this award. The TurboDisc® MaxBright® Multi-Reactor Metal Organic Chemical Vapor Deposition (MOCVD) System was awarded the Compound Semiconductor Manufacturing Award in 2012 for being the biggest breakthrough in compound semiconductor equipment.
“We are honored to receive the CS Manufacturing Award for the GENxplor, the first MBE system to be recognized in the compound semiconductor category,” commented Jim Northup, Vice President, General Manager for Veeco’s MBE Operations. “Since its introduction in 2013, the GENxplor has quickly become the R&D system of choice for leading research universities and institutions.”
About GENxplor R&D MBE System
Veeco’s GENxplor features an efficient single frame design that combines all vacuum hardware with on-board electronics to make it up to 40% smaller than other MBE systems, saving valuable lab space. 由于手动系统被集成在一个单一框架中，因此可减少安装时间。The open architecture design of the GENxplor also improves ease-of-use, provides convenient access to effusion cells, and allows easier serviceability when compared to other MBE systems. 与 Veeco 近期推出的可伸缩源结合使用时，GENxplor 系统堪称氧化物材料研究领域最先进的系统。
关于 Veeco
Veeco’s process equipment solutions enable the manufacture of LEDs, flexible OLEDs, power electronics, hard drives, MEMS and wireless chips. We are the market leader in LED, MBE, Ion Beam and other advanced thin film process technologies. 我们的高性能系统推动了能效、消费类电子产品和网络存储领域的创新，并且可以最大程度地提高我们客户的生产率并降低其拥有成本。For information on our company, products and worldwide service and support, please visit www.veeco.com .
To the extent that this news release discusses expectations or otherwise makes statements about the future, such statements are forward-looking and are subject to a number of risks and uncertainties that could cause actual results to differ materially from the statements made. These factors include the risks discussed in the Business Description and Management’s Discussion and Analysis sections of Veeco’s Annual Report on Form 10-K for the year ended December 31, 2013 and in our subsequent quarterly reports on Form 10-Q, current reports on Form 8-K and press releases. Veeco does not undertake any obligation to update any forward-looking statements to reflect future events or circumstances after the date of such statements.
Source: Veeco Instruments Inc.
Veeco Instruments Inc.
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