Bibliography

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Plasma Activation of Porous Polytetrafluoroethylene Membranes for Superior Hydrophilicity and Separation Performances via Atomic Layer Deposition of TiO2

Author(s): Xu, Qiang, Yang, Yang, Yang, Jie, Wang, Xiaozu, Wang, Zhaohui and Wang, Yong

Published: 2013

Web link: http://linkinghub.elsevier.com/retrieve/pii/S0376738813003608

Atomic Layer Deposition of MnS: Phase Control and Electrochemical Applications

Author(s): Riha, Shannon C, Koegel, Alexandra A, Meng, Xiangbo, Kim, In Soo, Cao, Yanqiang, Pellin, Michael J, Elam, Jeffrey W and Martinson, Alex B F

Published: 2016

Web link: http://pubs.acs.org/doi/10.1021/acsami.5b11075

A novel thermally-stable zirconium amidinate ALD precursor for ZrO2 thin films

Author(s): Lee, B, Choi, K J, Hande, A, Kim, M J, Wallace, R M, Kim, J, Senzaki, Y, Shenai, D, Li, H, Rousseau, M and Suydam, J

Published: 2009

Web link: http://dx.doi.org/10.1016/j.mee.2008.03.020

Environmental Implications of Nano-manufacturing

Author(s): Yuan, C and Zhang, T

Published: 2012

Web link: http://books.google.com/books?hl=en&lr=&id=XRqHvaKTXZYC&oi=fnd&pg=PA179&dq=Cambridge+Nanotech+(ALD)&ots=Tt_IH5vv7e&sig=2j4suB-ph70DYEhizYdQh9kLtQI

Effect of the blistering of ALD Al2O3 films on the silicon surface in Al-Al2O3-Si structures

Author(s): Acero, M C, Beldarrain, O, Duch, M, Zabala, M, Gonzalez, M B and Campabadal, F

Published: 2015

Web link: http://ieeexplore.ieee.org/lpdocs/epic03/wrapper.htm?arnumber=7087443

Vapor-Phase Metalation by Atomic Layer Deposition in a Metal?Organic Framework

Author(s): Mondloch, Joseph E, Bury, Wojciech, Fairen-Jimenez, David, Kwon, Stephanie, DeMarco, Erica J, Weston, Mitchell H, Sarjeant, Amy A, Nguyen, SonBinh T, Stair, Peter C, Snurr, Randall Q, Farha, Omar K and Hupp, Joseph T

Published: 2013

Web link: http://pubs.acs.org/doi/abs/10.1021/ja4050828

Experimental investigation of defect-assisted and intrinsic water vapor permeation through ultrabarrier films

Author(s): Kim, Hyungchul, Singh, Ankit Kumar, Wang, Cheng-Yin, Fuentes-Hernandez, Canek, Kippelen, Bernard and Graham, Samuel

Published: 2016

Web link: http://scitation.aip.org/content/aip/journal/rsi/87/3/10.1063/1.4942510

Electrical resistivity of Ti?Zn mixed oxide thin films deposited by atomic layer deposition

Author(s): Hazra, S K, Borgese, L, Federici, S, Bontempi, E and Ferrari, M

Published: 2012

Web link: http://www.sciencedirect.com/science/article/pii/S0040609012004282

Electrical properties of atomic-layer-deposited La< sub> 2 O< sub> 3 films using a novel La formamidinate precursor and ozone

Author(s): Lee, B, Park, T. J., Hande, A, Kim, M J and Wallace, R M