参考文献

Veeco CNT ALD customers are at the leading edge of ALD research around the world resulting in more publications than on any other commercial ALD platforms.

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Al2O3/ZrO2/Al2O3 High-k Dielectric Stacks on Germanium Substrates Grown by Atomic Layer Deposition at High and Low Temperatures

Author(s): Bethge, Ole, Abermann, Stephan, Henkel, Christoph and Bertagnolli, Emmerich

Published: 2008

Web link: http://ecst.ecsdl.org/cgi/doi/10.1149/1.2981618

Raman Spectroscopy of ZnO Thin Films by Atomic Layer Deposition

Author(s): Tapily, K, Gu, D, Baumgart, H, Rigo, M and Seo, J

Published: 2010

Web link: http://ecst.ecsdl.org/content/33/2/117.short

Introducing Carbon Diffusion Barriers for Uniform, High-Quality Graphene Growth from Solid Sources

Author(s): Weatherup, Robert S, Baehtz, Carsten, Dlubak, Bruno, Bayer, Bernhard C, Kidambi, Piran R, Blume, Raoul, Schloegl, Robert and Hofmann, Stephan

Published: 2013

Web link: http://pubs.acs.org/doi/abs/10.1021/nl401601x

LOW TEMPERATURE CRYSTALLINE TITANIUM DIOXIDE BY ATOMIC LAYER DEPOSITION FOR DYE-SENSITIZED SOLAR CELLS – ACS Applied Materials & Interfaces (ACS Publications)

Author(s): Chandiran, A K, Yella, A and Stefik, M

Published: 2013

Web link: http://pubs.acs.org/doi/abs/10.1021/am400866s

Interface layer in hafnia/Si films as a function of ALD cycles

Author(s): Mani-Gonzalez, Pierre-Giovanni, Vazquez-Lepe, Milton-Oswaldo, Espinosa-Magan?a, Francisco and Herrera-Gomez, Alberto

Published: 2013

Web link: http://link.aip.org/link/JVTAD6/v31/i1/p010601/s1&Agg=doi

Correlation of film density and wet etch rate in hydrofluoric acid of plasma enhanced atomic layer deposited silicon nitride

Author(s): Provine, J, Schindler, Peter, Kim, Yongmin, Walch, Steve P, Kim, Hyo Jin, Kim, Ki-Hyun and Prinz, Fritz B

Published: 2016

Web link:

Poly (3-hexylthiophene)/ZnO hybrid< equation> pn junctions for microelectronics applications

Author(s): Katsia, E, Huby, N and Tallarida, G

Published: 2009

Web link: http://ieeexplore.ieee.org/xpls/abs_all.jsp?arnumber=4837451

Characterization of Thin Film Dissolution in Water with in Situ Monitoring of Film Thickness Using Reflectometry

Author(s): Yersak, Alexander S, Lewis, Ryan J, Tran, Jenny and Lee, Yung C

Published: 2016

Web link: http://pubs.acs.org/doi/abs/10.1021/acsami.6b03606

Dissolution Behaviors and Applications of Silicon Oxides and Nitrides in Transient Electronics

Author(s): Kang, Seung-Kyun, Hwang, Suk-Won, Cheng, Huanyu, Yu, Sooyoun, Kim, Bong Hoon, Kim, Jae-Hwan, Huang, Yonggang and Rogers, John A

Published: 2014

Web link: http://doi.wiley.com/10.1002/adfm.201304293

Direct fabrication of high aspect-ratio metal oxide nanopatterns via sequential infiltration synthesis in lithographically defined SU-8 templates

Author(s): Nam, Chang-Yong, Stein, Aaron and Kisslinger, Kim

Published: 2015

Web link: http://scitation.aip.org/content/avs/journal/jvstb/33/6/10.1116/1.4929508