Bibliography

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Integrated Sustainability Analysis of Atomic Layer Deposition for Microelectronics Manufacturing

Author(s): Yuan, Chris Y and Dornfeld, David A

Published: 2010

Web link: http://link.aip.org/link/JMSEFK/v132/i3/p030918/s1&Agg=doi

Enhanced performance of dye-sensitized solar cells by an Al2O3 charge-recombination barrier formed by low-temperature atomic layer deposition

Author(s): Lin, Ching, Tsai, Feng-Yu, Lee, Min-Hsueh, Lee, Chia-Hua, Tien, Ta-Chang, Wang, Lih-Ping and Tsai, Song-Yeu

Published: 2009

Web link: http://xlink.rsc.org/?DOI=b819337a

Highly stable Li1.2Mn0.54Co0.13Ni0.13O 2 enabled by novel atomic layer deposited AlPO4 coating

Author(s): Xiao, Biwei, Wang, Biqiong, Liu, Jian, Kaliyappan, Karthikeyan, Sun, Qian, Liu, Yulong, Dadheech, Gayatri, Balogh, Michael P, Yang, Li, Sham, Tsun-Kong, Li, Ruying, Cai, Mei and Sun, Xueliang

Published: 2017

Web link: http://linkinghub.elsevier.com/retrieve/pii/S2211285517300848

Nondestructive nanostraw intracellular sampling for longitudinal cell monitoring

Author(s): Cao, Yuhong, Hjort, Martin, Chen, Haodong, Birey, Fikri, Leal-Ortiz, Sergio A, Han, Crystal M, Santiago, Juan G, Pa?ca, Sergiu P, Wu, Joseph C and Melosh, Nicholas A

Published: 2017

Web link: http://www.pnas.org/content/114/10/E1866.full

Crystallization behavior upon heating and cooling in Cu50Zr50 metallic glass thin films

Author(s): Lee, Dongwoo, Zhao, Bingge, Perim, Eric, Zhang, Haitao, Gong, Pan, Gao, Yulai, Liu, Yanhui, Toher, Cormac, Curtarolo, Stefano, Schroers, Jan and Vlassak, Joost J

Published: 2016

Web link: http://linkinghub.elsevier.com/retrieve/pii/S1359645416306693

Chemical interactions of thiophene with ZnO and Al-doped ZnO thin films

Author(s): Fouts, J A, Fowler, B, Shiller, P J and Doll, G L

Published: 2016

Web link: http://linkinghub.elsevier.com/retrieve/pii/S0257897216312841

ALD titanium nitride coated carbon nanotube electrodes for electrochemical supercapacitors

Author(s): Kao, E: Yang, C: Warren, R: Kozinda, A: Lin, L

Published: 2015

Web link: http://ieeexplore.ieee.org/lpdocs/epic03/wrapper.htm?arnumber=7180969

Fabrication of Thin Films of �-Fe 2O 3via Atomic Layer Deposition Using Iron Bisamidinate and Water under Mild Growth Conditions

Author(s): Avila, Jason R, Kim, Dong Wook, Rimoldi, Martino, Farha, Omar K and Hupp, Joseph T