参考文献

Veeco CNT ALD customers are at the leading edge of ALD research around the world resulting in more publications than on any other commercial ALD platforms.

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Atomic Layer Deposition Ultra-Barriers for Electronic Applications – Strategies and Implementation

Author(s): Carcia, P F, McLean, R S, Sauer, B. B. and Reilly, M H

Published: 2011

Web link: http://openurl.ingenta.com/content/xref?genre=article&issn=1533-4880&volume=11&issue=9&spage=7994

Atomic layer deposited Al2O3 passivation of type II InAs/GaSb superlattice photodetectors

Author(s): Salihoglu, Omer, Muti, Abdullah, Kutluer, Kutlu, Tansel, Tunay, Turan, Rasit, Kocabas, Coskun and Aydinli, Atilla

Published: 2012

Web link: http://link.aip.org/link/JAPIAU/v111/i7/p074509/s1&Agg=doi

Low-Temperature Self-Limiting Growth of III-Nitride Thin Films by Plasma-Enhanced Atomic Layer Deposition

Author(s): Biyikli, Necmi: Ozgit, Cagla: Donmez, Inci

Published: 2012

Web link: http://openurl.ingenta.com/content/xref?genre=article&issn=1941-4900&volume=4&issue=10&spage=1008

Transfer of Preformed Three?Dimensional Photonic Crystals onto Dye?Sensitized Solar Cells

Author(s): Mihi, A, Zhang, C and Braun, P V

Published: 2011

Web link: http://onlinelibrary.wiley.com/doi/10.1002/ange.201100446/full

Stabilization of a very high-k crystalline ZrO2 phase by post deposition annealing of atomic layer deposited ZrO2/La2O3 dielectrics on germanium

Author(s): Abermann, S, Henkel, C, Bethge, O, Pozzovivo, G, Klang, P and Bertagnolli, E

Published: 2010

Web link: http://dx.doi.org/10.1016/j.apsusc.2010.03.049

On the choice of the test structure for the electrical characterization of dielectrics for silicon solar cells

Author(s): Loozen, X, O?Sullivan, B J and Rothschild, A.

Published: 2010

Web link: http://onlinelibrary.wiley.com/doi/10.1002/pssr.201004361/full

Electrical Properties of high-k ALD HfO2 deposited on strained Si Layers Epitaxially grown on Si0. 8Ge0. 2/Si Substrates

Author(s): Shrestha, P R, Gu, D, Tapily, K and Baumgart, H

Published: 2008

Web link: http://ecst.ecsdl.org/content/16/4/51.short

Exploiting optothermal conversion for nanofabrication: site-selective generation of Au/TiO2 inverse opals

Author(s): Alessandri, I and Ferroni, M

Published: 2009

Web link: http://pubs.rsc.org/en/content/articlehtml/2009/jm/b913478f

Mechanical Characterization of Atomic Layer Deposited (ALD) Alumina for Applications in Corrosive Environments

Author(s): Ou, K S, Lin, I, Wu, P H, Huang, Z K and Chen, K S

Published: 2009

Web link: http://journals.cambridge.org/abstract_S1946427400019357

Comparison of trimethylgallium and triethylgallium as ?Ga? source materials for the growth of ultrathin GaN films on Si (100) substrates via hollow-cathode plasma-assisted atomic layer deposition

Author(s): Alevli, Mustafa: Haider, Ali: Kizir, Seda: Leghari, Shahid A: Biyikli, Necmi

Published: 2016

Web link: http://scitation.aip.org/content/avs/journal/jvsta/34/1/10.1116/1.4937725