参考文献

Veeco CNT ALD customers are at the leading edge of ALD research around the world resulting in more publications than on any other commercial ALD platforms.

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Process Control of Atomic Layer Deposition Molybdenum Oxide Nucleation and Sulfidation to Large-Area MoS 2Monolayers

Author(s): Keller, Brent D, Bertuch, Adam, Provine, J., Sundaram, Ganesh, Ferralis, Nicola and Grossman, Jeffrey C

Published: 2017

Web link: http://pubs.acs.org/doi/abs/10.1021/acs.chemmater.6b03951

Effect of substrate temperature and Ga source precursor on growth and material properties of GaN grown by hollow cathode plasma assisted atomic layer deposition

Author(s): Haider, Ali: Kizir, Seda: Deminskyi, Piter: Tsymbalenko, Oleksandr: Leghari, Shahid Ali: Biyikli, Necmi: Alevli, Mustafa: Gungor, Nese

Published: 2016

Web link: http://ieeexplore.ieee.org/lpdocs/epic03/wrapper.htm?arnumber=7493030

Effects of Thermal Treatments on the Trapping Properties of HfO2 Films for Charge Trap Memories

Author(s): Spiga, S., Driussi, F and Lamperti, A

Published: 2012

Web link: http://ww.w.theeestory.com/files/HfO_Films_Spiga.pdf

Stack engineering of TANOS charge-trap flash memory cell using high-? ZrO< sub> 2 grown by ALD as charge trapping layer

Author(s): Congedo, G., Lamperti, A, Lamagna, L and Spiga, S.

Published: 2011

Web link: http://www.sciencedirect.com/science/article/pii/S016793171100325X

A study on III-nitride recessed-gate field-effect transistors using a remote-oxygen-plasma treatment

Author(s): Lee, Y. C.: Kao, T-T: Shen, S-C

Published: 2015

Web link: http://iopscience.iop.org/0268-1242/30/4/045010/article/

Impact of Germanium Surface Conditioning and ALD-growth Temperature on Al2O3/ZrO2 High-k Dielectric Stacks

Author(s): Bethge, Ole, Abermann, Stephan, Henkel, Christoph, Straif, Christoph J, Hutter, Herbert and Bertagnolli, Emmerich

Published: 2009

Web link: http://jes.ecsdl.org/cgi/doi/10.1149/1.3205455

Sub-Nanometer Atomic Layer Deposition for Spintronics in Magnetic Tunnel Junctions Based on Graphene Spin-Filtering Membranes

Author(s): Martin, Marie-Blandine, Dlubak, Bruno, Weatherup, Robert S, Yang, Heejun, Deranlot, Cyrile, Bouzehouane, Karim, Petroff, Fr�d�ric, Anane, Abdelmadjid, Hofmann, Stephan, Robertson, John, Fert, Albert and Seneor, Pierre

Published: 2014

Web link: http://pubs.acs.org/doi/abs/10.1021/nn5017549

Atomic layer deposition of germanium?doped zinc oxide films with tuneable ultraviolet emission

Author(s): Chalker, P R, Marshall, P A, King, P J and Dawson, K

Published: 2012

Web link: http://pubs.rsc.org/en/content/articlepdf/2012/jm/c2jm31391j

Environmental performance characterization of atomic layer deposition

Author(s): Yuan, C Y and Dornfeld, D

Published: 2008

Web link: http://ieeexplore.ieee.org/xpls/abs_all.jsp?arnumber=4562943

Understanding the Origin of Photoelectrode Performance Enhancement by Probing Surface Kinetics

Author(s): Thorne, James E, Jang, Jiwook, Liu, Erik and Wang, Dunwei

Published: 2016

Web link: http://pubs.rsc.org/en/Content/ArticleLanding/2016/SC/C5SC04519C