参考文献

Veeco CNT ALD customers are at the leading edge of ALD research around the world resulting in more publications than on any other commercial ALD platforms.

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Hydrophilic/hydrophobic surface of Al2O3thin films grown by thermal and plasma-enhanced atomic layer deposition on plasticized polyvinyl chloride (PVC)

Author(s): Wang, Li-Chun: Han, Yin-Yi: Yang, Kai-Chiang: Chen, Miin-Jang: Lin, Hsin-Chih: Lin, Chung-Kwei: Hsu, Yu-Tong

Published: 2016

Web link: http://linkinghub.elsevier.com/retrieve/pii/S025789721630740X

Atomic layer deposition of TiO2 from tetrakis(dimethylamino)titanium and H2O

Author(s): Abendroth, Barbara, Moebus, Theresa, Rentrop, Solveig, Strohmeyer, Ralph, Vinnichenko, Mykola, Weling, Tobias, St�cker, Hartmut and Meyer, Dirk C

Published: 2013

Web link: http://linkinghub.elsevier.com/retrieve/pii/S0040609013012777

Photoelectrochemical Behavior of n-type Si(100) Electrodes Coated with Thin Films of Manganese Oxide Grown by Atomic Layer Deposition

Author(s): Strandwitz, Nicholas, Comstock, David, Grimm, Ronald L, Nichols-Nielander, Adam C, Elam, Jeffrey W and Lewis, Nathan S

Published: 2013

Web link: http://pubs.acs.org/doi/abs/10.1021/jp311207x

Effect of Processing Conditions on the Electrical Characteristics of Atomic Layer Deposited Al2O3 and HfO2 Films

Author(s): Rafi, Joan Marc, Zabala, Miguel, Beldarrain, Oihane and Campabadal, Francesca

Published: 2010

Web link: http://ecst.ecsdl.org/cgi/doi/10.1149/1.3372577

Structure and stimulated emission of a high-quality zinc oxide epilayer grown by atomic layer deposition on the sapphire substrate

Author(s): Chen, H C, Chen, M J, Liu, T C, Yang, J R and Shiojiri, M

Published: 2010

Web link: http://dx.doi.org/10.1016/j.tsf.2010.07.069

Highly efficient planar perovskite solar cells through band alignment engineering

Author(s): Correa Baena, Juan Pablo, Steier, Ludmilla, Tress, Wolfgang, Saliba, Michael, Neutzner, Stefanie, Matsui, Taisuke, Giordano, Fabrizio, Jacobsson, T Jesper, Srimath Kandada, Ajay Ram, Zakeeruddin, Shaik M, Petrozza, Annamaria, Abate, Antonio, Nazeeruddin, Mohammad Khaja, Gr�tzel, Michael and Hagfeldt, Anders

Published: 2015

Web link: http://xlink.rsc.org/?DOI=C5EE02608C

Low temperature atomic layer deposition of highly photoactive hematite using iron(iii) chloride and water

Author(s): Klug, Jeffrey A, Becker, Nicholas G, Riha, Shannon C, Martinson, Alex B F, Elam, Jeffrey W, Pellin, Michael J and Proslier, Thomas

Published: 2013

Web link: http://xlink.rsc.org/?DOI=c3ta12514a

High-Performance and Traditional Multicrystalline Silicon: Comparing Gettering Responses and Lifetime-Limiting Defects

Author(s): Castellanos, Sergio, Ekstr?m, Kai E, Autruffe, Antoine, Jensen, Mallory A, Morishige, Ashley E, Hofstetter, Jasmin, Yen, Patricia, Lai, Barry, Stokkan, Gaute, del Ca�izo, Carlos and Buonassisi, Tonio

Published: 2016

Web link: http://ieeexplore.ieee.org/lpdocs/epic03/wrapper.htm?arnumber=7447656

Optical and electrical characterization of defects in zinc oxide thin films grown by atomic layer deposition

Author(s): TOMASZ, A, ?uka, G and Wachnicki, ?

Published: 2009

Web link: http://www.ifpan.edu.pl/ON-4/on42/website/publications/on42_116.pdf

Experimental Study of Process Emissions from Atomic Layer Deposition of Al 2O 3under Various Temperatures and Purge Time

Author(s): Ma, Lulu, Pan, Dongqing, Xie, Yuanyuan, Wang, Fenfen and Yuan, Chris

Published: 2017

Web link: http://manufacturingscience.asmedigitalcollection.asme.org/article.aspx?doi=10.1115/1.4035722