参考文献

Veeco CNT ALD customers are at the leading edge of ALD research around the world resulting in more publications than on any other commercial ALD platforms.

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Defining and Overcoming the Contact Resistance Challenge in Scaled Carbon Nanotube Transistors

Author(s): Franklin, Aaron D: Farmer, Damon B: Haensch, Wilfried

Published: 2014

Web link: http://pubs.acs.org/doi/abs/10.1021/nn5024363

Nanowire-Based Electrode for Acute In Vivo Neural Recordings in the Brain

Author(s): Suyatin, Dmitry B, Wallman, Lars, Thelin, Jonas, Prinz, Christelle N, J�rntell, Henrik, Samuelson, Lars, Montelius, Lars and Schouenborg, Jens

Published: 2013

Web link: http://dx.plos.org/10.1371/journal.pone.0056673

Improving the Photoelectrochemical Performance of Hematite by Employing a High Surface Area Scaffold and Engineering Solid-Solid Interfaces

Author(s): Chakthranont, Pongkarn, Pinaud, Blaise A, Seitz, Linsey C, Forman, Arnold J and Jaramillo, Thomas F

Published: 2016

Web link: http://doi.wiley.com/10.1002/admi.201500626

Atomic Layer Deposition of the Quaternary Chalcogenide Cu 2ZnSnS 4

Author(s): Thimsen, Elijah, Riha, Shannon C, Baryshev, Sergey V, Martinson, Alex B F, Elam, Jeffrey W and Pellin, Michael J

Published: 2012

Web link: http://pubs.acs.org/doi/abs/10.1021/cm3015463

Comparison of Electromigration in Cu Interconnects with ALD or

Author(s): Liners, PVDTN

Published: 2007

Web link: http://books.google.com/books?hl=en&lr=&id=_RTBFCr9RNgC&oi=fnd&pg=PA139&dq=Cambridge+Nanotech+((ALD)+savannah)&ots=5MoztySJp7&sig=rfLGsflXMSsMiwX0B12NdFMtt-s

Combining HRTEM�??EELS nano-analysis with capacitance�??voltage measurements to evaluate high-?� thin films deposited on Si and Ge as candidate for future gate dielectrics

Author(s): Schamm-Chardon, S, Coulon, P E, Lamagna, L, Wiemer, C., Baldovino, S and Fanciulli, M.

Published: 2010

Web link: http://dx.doi.org/10.1016/j.mee.2010.10.012

An aqueous, organic dye derivatized SnO2/TiO2 core/shell photoanode

Author(s): Wee, Kyung-Ryang, Sherman, Benjamin D, Brennaman, M Kyle, Sheridan, Matthew V, Nayak, Animesh, Alibabaei, Leila and Meyer, Thomas J

Published: 2015

Web link: http://pubs.rsc.org/en/content/articlehtml/2016/ta/c5ta06678f

Low-Temperature Atomic Layer Deposited Al2O3 Thin Film on LiCoO2 Cathode for Enhanced Cyclability of Lithium-Ion Batteries

Author(s): Wang, Fu-Ming, Cheng, Chin S, Li, Chia-Chen and Lee, Jyh-Tsung

Published: 2009

Web link: http://ma.ecsdl.org/content/MA2009-02/7/457.abstract

Processing-Structure-Tribological Property Interrelationships of Zinc Titanate Coatings Grown by Atomic Layer Deposition

Author(s): Ageh, V, Mohseni, H. and Scharf, T. W.

Published: 2013

Web link: http://linkinghub.elsevier.com/retrieve/pii/S0257897213009912

High-k ZrO2 dielectric thin films on GaAs semiconductor with reduced regrowth of native oxides by atomic layer deposition

Author(s): Konda, R. B., White, C, Smak, J, Mundle, R., Bahoura, M. and Pradhan, A. K.

Published: 2013

Web link: http://linkinghub.elsevier.com/retrieve/pii/S0009261413010208