参考文献

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Deposition of HfO< sub> 2 on InAs by atomic-layer deposition

Author(s): Wheeler, D, Wernersson, L E and Fr�berg, L

Published: 2009

Web link: http://www.sciencedirect.com/science/article/pii/S0167931709002603

Electrical characteristics of ZrO2/GaAs MOS capacitor fabricated by atomic layer deposition | Browse – Journal of Vacuum Science & Technology A

Author(s): Konda, R. B., White, C, Thomas, D and Yang, Q

Published: 2013

Web link: http://link.aip.org/link/?JVTAD6/31/041505/1

ZnO, ZnMnO and ZnCoO films grown by atomic layer deposition

Author(s): ?ukasiewicz, M I, W�jcik-G?odowska, A, Guziewicz, E, Wolska, A, Klepka, M T, D?u?ewski, P, Jakie?a, R, ?usakowska, E, Kopalko, K, Paszkowicz, W, Wachnicki, ?, Witkowski, B S, Lisowski, W, Krawczyk, M, Sobczak, J W, Jab?o?ski, A and Godlewski, M

Published: 2012

Web link: http://stacks.iop.org/0268-1242/27/i=7/a=074009?key=crossref.3468d1abb84a44318782b13426c32e5b

Second?Harmonic Generation from ZnO/Al2O3 Nanolaminate Optical Metamaterials Grown by Atomic?Layer Deposition

Author(s): Wickberg, Andreas, Kieninger, Clemens, S�rgers, Christoph, Schlabach, Sabine, Mu, Xiaoke, Koos, Christian and Wegener, Martin

Published: 2016

Web link: http://onlinelibrary.wiley.com/doi/10.1002/adom.201600200/full

A Facile Route for Producing Single-Crystalline Epitaxial Perovskite Oxide Thin Films

Author(s): Akbashev, Andrew R, Chen, Guannan and Spanier, Jonathan E

Published: 2013

Web link: http://pubs.acs.org/doi/abs/10.1021/nl4030038

Multi-Layered Al2O3/HfO2/SiO2/Si3N4/SiO2 Thin Dielectrics for Charge Trap Memory Applications

Author(s): Congedo, G., Lamperti, A, Salicio, O and Spiga, S.

Published: 2012

Web link: http://jss.ecsdl.org/cgi/doi/10.1149/2.010301jss

Spatial analysis of failure sites in large area MIM capacitors using wavelets

Author(s): Mu�oz-Gorriz, J: Monaghan, S.: Cherkaoui, K: Su��, J: Hurley, P K: Miranda, E.

Published: 2017

Web link: http://linkinghub.elsevier.com/retrieve/pii/S0167931717301399

Electron Irradiation Effects on Atomic Layer Deposited High-k Gate Dielectrics

Author(s): Garc�a, H�ctor, Cast�n, Helena, Due�as, Salvador, Bail�n, Luis, Campabadal, Francesca, Rafi, Joan Marc, Zabala, Miguel, Beldarrain, Oihane, Ohyama, Hidenori, Takakura, Kenichirou and Tsunoda, Isao

Published: 2011

Web link: http://ecst.ecsdl.org/cgi/doi/10.1149/1.3633051

Hollow cathode plasma-assisted atomic layer deposition of crystalline AlN, GaN and AlxGa1?xN thin films at low temperatures

Author(s): Ozgit-Akgun, Cagla: Goldenberg, Eda: Okyay, Ali Kemal: Biyikli, Necmi

Published: 2014

Web link: http://pubs.rsc.org/en/content/articlehtml/2014/tc/c3tc32418d

Antireflection ln2O3 coatings of self?organized TiO2 nanotube layers prepared by atomic layer deposition

Author(s): Macak, Jan M: Prikryl, Jan: Sopha, Hanna: Strizik, Lukas

Published: 2015

Web link: http://onlinelibrary.wiley.com/doi/10.1002/pssr.201510245/full