参考文献

Veeco CNT ALD customers are at the leading edge of ALD research around the world resulting in more publications than on any other commercial ALD platforms.

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Growth mode transition of atomic layer deposited Al2O3 on porous TiO2 electrodes of dye-sensitized solar cells

Author(s): Tien, Ta-Chang, Pan, Fu-Ming, Wang, Lih-Ping, Tsai, Feng-Yu and Lin, Ching

Published: 2012

Web link: http://linkinghub.elsevier.com/retrieve/pii/S0040609011015598

Differentiation of Complex Vapor Mixtures Using Versatile DNA-Carbon Nanotube Chemical Sensor Arrays

Author(s): Kybert, Nicholas J, Lerner, Mitchell B, Yodh, Jeremy S, Preti, George and Johnson, A T Charlie

Published: 2013

Web link: http://pubs.acs.org/doi/abs/10.1021/nn400359c

Atomic layer deposition TiO2/Al2O3 nanolayer of dyed polyamide/aramid blend fabric for high intensity UV light protection

Author(s): Xiao, Xingfang, Liu, Xin, Cao, Genyang, Zhang, Chunhua, Xia, Liangjun, Xu, Weilin and Xiao, Shili

Published: 2015

Web link: http://onlinelibrary.wiley.com/doi/10.1002/pen.24068/full

Atomic layer deposition of optical coatings inside microchannels

Author(s): Gabriel, N T and Talghader, J J

Published: 2009

Web link: http://ieeexplore.ieee.org/xpls/abs_all.jsp?arnumber=5338588

Improving high-capacity Li1.2Ni0.15Mn0.55Co0.1O2-based lithium-ion cells by modifiying the positive electrode with alumina

Author(s): Bettge, Martin, Li, Yan, Sankaran, Bharat, Rago, Nancy Dietz, Spila, Timothy, Haasch, Richard T, Petrov, Ivan and Abraham, Daniel P

Published: 2013

Web link: http://linkinghub.elsevier.com/retrieve/pii/S0378775313001316

Rutile-structured TiO2 deposited by plasma enhanced atomic layer deposition using tetrakis(dimethylamino)titanium precursor on in-situ oxidized Ru electrode

Author(s): Pointet, John: Gonon, Patrice: Latu-Romain, Lawrence: Bsiesy, Ahmad: Vall�e, Christophe

Published: 2014

Web link: http://scitation.aip.org/content/avs/journal/jvsta/32/1/10.1116/1.4843515

Combining HRTEM?EELS nano-analysis with capacitance?voltage measurements to evaluate high-? thin films deposited on Si and Ge as candidate for future gate ?

Author(s): Schamm-Chardon, S, Coulon, P E and Lamagna, L

Published: 2011

Web link: http://www.sciencedirect.com/science/article/pii/S0167931710003722

A Study on Reducing Contact Resistance in Solution-Processed Organic Field-Effect Transistors

Author(s): Choi, Sangmoo, Fuentes-Hernandez, Canek, Wang, Cheng-Yin, Khan, Talha M, Larrain, Felipe A, Zhang, Yadong, Barlow, Stephen, Marder, Seth R and Kippelen, Bernard

Published: 2016

Web link: http://pubs.acs.org/doi/abs/10.1021/acsami.6b07029

Low-Temperature Deposition of Hexagonal Boron Nitride Via Sequential Injection of Triethylboron and N 2/H 2Plasma

Author(s): Haider, Ali: Ozgit-Akgun, Cagla: Goldenberg, Eda: Okyay, Ali Kemal: Biyikli, Necmi

Published: 2014

Web link: http://doi.wiley.com/10.1111/jace.13213

ZnS/ZnO@CNT and ZnS@CNT nanocomposites by gas phase conversion of ZnO@CNT. A systematic study of their photocatalytic properties

Author(s): Okeil, Sherif, Krausmann, Jan, D�nges, Inga, Pfleger, Sandra, Engstler, J�rg and Schneider, J�rg J

Published: 2017

Web link: http://pubs.rsc.org/en/content/articlehtml/2017/dt/c7dt00407a